http://www.freepatentsonline.com/EP1610940.html

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Note added at 1 hr (2009-02-07 00:39:07 GMT)
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METHOD OF DEPOSITING FUNCTIONAL FILMS ON SUBSTRATES SUCH AS GLASS SHEETS AND FILM-COATING MACHINE FOR IMPLEMENTING SAID METHOD Document Type and Number:Kind Code:A2
Abstract:Abstract not available for EP1610940
Abstract of corresponding document: FR2852553
The deposition of a functional film (5) on at least a part of one or two surfaces of a flat or curved substrates (2) consists of: (a) feeding the substrates one by one into a filming station for them to defile through a film applying assembly (4) containing at least one axis which is perpendicular to the sense of defilement and parallel to the **defilement** plane and on which is mounted at least one reel of film; (b) feeding the initial section (10) of the film from each reel to be applied and maintained on a surface of the substrate at the chosen location; (c) provoking the unreeling of the reel(s) to apply the film in layers on the **defiling substrate**; and (d) cutting the film(s) at a chosen moment whilst retaining the new beginning section of the film for it to be applied at the chosen

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Note added at 1 hr (2009-02-07 00:42:32 GMT)
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... while in this reference:

http://www.techtrans.com.fr/Glossary.PDF

"durabilite de defilement" is translated as "running durability"..

May be running is used here to refer to the process of "defilement"...

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Note added at 1 hr (2009-02-07 00:43:25 GMT)
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rulings stries (opti)
ruled grating réseau ligné (opti)
run essai (chem)
run length codes codes de longueurs de plages (comp)
run length data données codées en longueurs de plages (comp)
**running durability durabilité de défilement (chem)**
ryegrass ivraie

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Note added at 1 hr (2009-02-07 00:48:39 GMT)
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The following is another reference on "defiling"..

http://www.patentstorm.us/patents/5394829/description.html

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Note added at 1 hr (2009-02-07 00:50:10 GMT)
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Since the inert gas inlet part is disposed in the upper part of the pulling chamber and the inert gas outlet part is separated from the inert gas inlet part mentioned above and disposed at a position above the pulling chamber, the inert gas flowing from the inert gas inlet part to the inert gas outlet part forms a current of itself in the upper part of the pulling chamber and this current of the inert gas avoids contacting the internal mambers of the pulling chamber which abhor **defilement.** The SiO which emanates from the molten silicon mass inside the crucible and diffuses in the upper part of the pulling chamber, therefore, is discharged through th inert gas outlet part as entrained by the current of inert gas mentioned above. Here, the probability of the SiO colliding against the surfaces of the internal members of the pulling chamber en route to the upper part of the pulling chamber is very small and consequently the depositon of the condensate originating in the SiO on the graphite members in the pulling chamber is greatly curbed because the SiO vaporizes gently from the molten silicon mass and further because the cross-sectional area of the path of SiO directed toward the upper part of the pulling chamber is very large.



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Note added at 1 hr (2009-02-07 00:59:46 GMT)
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Yet, another "intriguing" reference to "defilade" (defilement, Fr.)

http://civilwarfortifications.com/dictionary/xgp-009.html


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Note added at 1 hr (2009-02-07 01:05:11 GMT)
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In this reference, "defilading" is the term used a number of times:

http://www.patentstorm.us/patents/5262033/description.html

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Note added at 1 hr (2009-02-07 01:06:26 GMT)
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INTRODUCTION

The present invention concerns a method and apparatus for plating stainless steel strips with aluminum in which, prior to plating, the strip is cleaned by passing into an electric gaseous discharge.

The continuous cleaning or etching of **defilading** elongated substrates such as wire, strips, bands and the like by ion bombardment prior to coating with another material or metal is known. This technique is indeed considered much more effective in the case of high chromium content alloys than the more conventional high temperature reductive cleaning treatments because chromium oxide is difficult to reduce and poor reduction efficiency is likely to cause problems of adhesion of the final aluminum layer. Some pertinent prior art in this field is summarized below.


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Note added at 1 hr (2009-02-07 01:10:07 GMT)
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It seems that in chemical vapor deposition, defilading is some type of "masking" which, as you know, is a very common process in chemical vapor deposition (i.e. protecting during etching or depositing, etc.)


Here is a definition I found (one can see why this term is used in chemical vapor deposition):


Defilading (n.) The art or act of determining the directions and heights of the lines of rampart with reference to the protection of the interior from exposure to an enemy's fire from any point within range, or from any works which may be erected.

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Note added at 1 hr (2009-02-07 01:10:49 GMT)
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So, I would probably go with "defilading" rather than "defilement"....

if the processed material moves through the reactor continuously, as opposed to applying the film in batches, this might be a possibility. As to the order of the qualifiers, that's another kettle of fish!
HTH