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process proximity

Dutch translation: procesnabijheid/afstand tot het proces

08:24 Aug 27, 2011
English to Dutch translations [PRO]
Tech/Engineering - Photography/Imaging (& Graphic Arts)
English term or phrase: process proximity
It is obvious for the skilled person to combine the distribution mentioned in claim 2 of document D4 with the requirement of homogeneous density of features on masks which is discussed in par. 38.
He would do this also to decrease the influence of process proximity which is a well known problem in the field.
Michel Asselbergs
Netherlands
Local time: 21:38
Dutch translation:procesnabijheid/afstand tot het proces
Explanation:
The mirror responsible for collecting the light is directly exposed to the plasma and is therefore vulnerable to damage from the high-energy ions[13][14] and other debris.[15] This damage associated with the high-energy process of generating EUV radiation has precluded the successful implementation of practical EUV light sources for lithography.
En:
Contact printing is liable to damage both the mask and the wafer, and this was the primary reason it was abandoned for high volume production. Both contact and proximity lithography require the light intensity to be uniform across an entire wafer, and the mask to align precisely to features already on the wafer. As modern processes use increasingly large wafers, these conditions become increasingly difficult.
Het proces is daar waar de EUV-straling wordt gegenereerd en degene die het uitvoert dient op de invloed van de afstand tot het proces te letten, omdat dat problemen oplevert.
Selected response from:

Akke Wagenaar
Local time: 19:38
Grading comment
Bedankt
3 KudoZ points were awarded for this answer



Summary of answers provided
4procesnabijheid/afstand tot het proces
Akke Wagenaar


  

Answers


1 day 8 hrs   confidence: Answerer confidence 4/5Answerer confidence 4/5
procesnabijheid/afstand tot het proces


Explanation:
The mirror responsible for collecting the light is directly exposed to the plasma and is therefore vulnerable to damage from the high-energy ions[13][14] and other debris.[15] This damage associated with the high-energy process of generating EUV radiation has precluded the successful implementation of practical EUV light sources for lithography.
En:
Contact printing is liable to damage both the mask and the wafer, and this was the primary reason it was abandoned for high volume production. Both contact and proximity lithography require the light intensity to be uniform across an entire wafer, and the mask to align precisely to features already on the wafer. As modern processes use increasingly large wafers, these conditions become increasingly difficult.
Het proces is daar waar de EUV-straling wordt gegenereerd en degene die het uitvoert dient op de invloed van de afstand tot het proces te letten, omdat dat problemen oplevert.


    Reference: http://en.wikipedia.org/wiki/Extreme_ultraviolet_lithography
    Reference: http://en.wikipedia.org/wiki/Photolithography
Akke Wagenaar
Local time: 19:38
Native speaker of: Native in DutchDutch
PRO pts in category: 3
Grading comment
Bedankt
Notes to answerer
Asker: Bedankt, ik had ook eerst voor deze letterlijke vertaling gekozen, maar ben absoluut niet bekend met de materie en kon het niet vinden. Uiteindelijk heb ik er voor gekozen de term in het Engels te laten omdat ik niet wist wat er bedoeld werd. Wel blijkt nu dat ik iets had kunnen vinden onder 'proximity effect'. In de context van deze vertaling was de precieze vertaling van dit begrip uiteindelijk niet het belangrijkste.

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